Research output

  1. Towards 2-10 nm electron-beam lithography: a quantitative approach

    Research output: Contribution to journalArticleScientificpeer-review

  2. Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

    Research output: Contribution to journalArticleScientificpeer-review

  3. Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

    Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

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