1. 1999
  2. Potential use of laser annealing in semiconductor processing [op CD-Rom verschenen]

    Nanver, LK., Ren, Q., Mallee, RJM., Slabbekoorn, JHCM., Bertens, GJ., Goudena, EJG., van den Berg, MR., Schellevis, H., van Zeijl, HW., Scholtes, TLM. & van Oever, LCM., 1999, Proceedings. G Zweier (ed.). S.l.: s.n., p. 214-221 8 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientific

  3. Ultra-low-temperature low-ohmic contacts for SOA applications

    Nanver, LK., van Zeijl, HW., Schellevis, H., Mallee, RJM., Slabbekoorn, JHCM., Dekker, R. & Slotboom, JW., 1999, BCTM proceedings. Piscataway: IEEE Society, p. 137-140 4 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  4. Yield improvement in high-frequency BJT with self-aligned metallization

    van Zeijl, HW. & Nanver, LK., 1999, SAFE99: proceedings. ProRISC99: proceedings [CD-ROM]. JP Veen (ed.). Utrecht: STW Technology Foundation, p. 607-610 4 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  5. 2000
  6. A low-cost BiCMOS process with metal gates

    van Zeijl, HW. & Nanver, LK., 2000, Symposium proceedings. Vol. 611. LA Clevenger & ... [et Al] (eds.). Warrendale: Material Research Society, p. 1-6 6 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  7. Backwafer optical lithography and wafer distortion in substrate transfer technologies

    van Zeijl, HW., Slabbekoorn, JHCM., Nanver, LK., van Dijk, PWL., Berthold, A. & Machielsen, T., 2000, Proceedings of SPIE, vol. 4181. D Burnett, S Kimura & B Singh (eds.). Bellingham: International Society for Optical Engineering, p. 200-207 8 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  8. Electrical detection and simulation of stress in silicon nitride spacer technology

    van Zeijl, HW., Mijalkovic, S. & Nanver, LK., 2000, 3rd International Conference on Materials for Microelectronics: proceedings. London: IOM Communications, p. 231-234 4 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  9. Elimination of TED and base leakage in collector-up SIGE HBT's

    van Oever, LCM., Nanver, LK., Scholtes, TLM., van Zeijl, HW., van Noort, WD., Ren, Q. & Slotboom, JW., 2000, ICCD-2000 proceedings, vol. 1. SL Maskara & TS Lamba (eds.). New Delhi: Allied Publishers, p. 141-144 4 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientific

  10. Front- to backwafer alignment, overlay and wafer distortion in substrate transfer technologies

    van Zeijl, HW., Slabbekoorn, JHCM., Nanver, LK., van Dijk, PWL. & Machielsen, T., 2000, SAFE-ProRISC-SeSens 2000: proceedings. JP Veen (ed.). Utrecht: STW Technology Foundation, p. 163-167 5 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientific

  11. The influence of mechanical stresses on the characteristics of bipolar transistors

    Jun, F., Mijalkovic, S., Eysenga, WJ., van Zeijl, HW. & Crans, W., 2000, SAFE2000 CD-ROM. Utrecht: STW Technology Foundation, p. 79-85 7 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientific

  12. 2001
  13. Applied I-line lithography

    van Zeijl, HW., 2001, Delft: DIMES, TU Delft. 403 p.

    Research output: Book/ReportReportProfessional

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