1. 2019
  2. Electron beam technology for single nanometer fabrication

    Scotuzzi, M., 12 Aug 2019, 292 p.

    Research output: ThesisDissertation (TU Delft)Scientific

  3. 2018
  4. Charged particle single nanometre manufacturing

    Prewett, P. D., Hagen, C. W., Lenk, C., Lenk, S., Kaestner, M., Ivanov, T., Ahmad, A., Robinson, A. P. G., Hari, S., Scotuzzi, M. & More Authors, 2018, In : Beilstein Journal of Nanotechnology. 9, 1, p. 2855-2882

    Research output: Contribution to journalReview articleScientificpeer-review

  5. Nanoscale imaging of light-matter coupling inside metal-coated cavities with a pulsed electron beam

    Moerland, R. J., Weppelman, G., Scotuzzi, M. & Hoogenboom, J. P., 2018, In : Nano Letters: a journal dedicated to nanoscience and nanotechnology.

    Research output: Contribution to journalArticleScientificpeer-review

  6. 2017
  7. Electron transport and room temperature single-electron charging in 10 nm scale PtC nanostructures formed by electron beam induced deposition

    Durrani, Z. A. K., Jones, M. E., Wang, C., Scotuzzi, M. & Hagen, C. W., 3 Nov 2017, In : Nanotechnology. 28, 47, 474002.

    Research output: Contribution to journalArticleScientificpeer-review

  8. Multi-color electron microscopy by element-guided identification of cells, organelles and molecules

    Scotuzzi, M., Kuipers, J., Wensveen, D. I., De Boer, P., Hagen, K. C. W., Hoogenboom, J. P. & Giepmans, B. N. G., 7 Apr 2017, In : Scientific Reports. 7, 8 p., 45970.

    Research output: Contribution to journalArticleScientificpeer-review

  9. Apparatus and method for irradiating a surface of a sample using charged particle beams

    Kruit, P., Scotuzzi, M. & Hagen, C. W., 2017, IPC No. H01J, Priority date 30 May 2016, Priority No. NL 2016853

    Research output: PatentOther research output

  10. 2015
  11. Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

    Scotuzzi, M., Kamerbeek, MJ., Goodyear, A., Cooke, M. & Hagen, CW., 2015, Alternative Lithographic Technologies VII. Resnick, DJ. & Bencher, C. (eds.). Bellingham, WA, USA: SPIE, p. 1-12 12 p. (Proceedings of SPIE- International Society for Optical Engineering; vol. 9423).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  12. Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition

    Scotuzzi, M., Kamerbeek, MJ., Goodyear, A., Cooke, M. & Hagen, CW., 2015, In : Journal of Micro-Nanolithography MEMS and MOEMS. 14, 3, p. 1-10 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

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