1. 2019
  2. A study of the reproducibility of electron beam induced deposition for sub-20 nm lithography

    Hari, S., Verduin, T., Kruit, P. & Hagen, C. W., 2019, In : Micro and Nano Engineering. 4, p. 1-6

    Research output: Contribution to journalArticleScientificpeer-review

  3. 2017
  4. Quantum Noise Effects in e-Beam Lithography and Metrology

    Verduin, T., 2017, 201 p.

    Research output: ThesisDissertation (TU Delft)Scientific

  5. 2016
  6. GPU accelerated Monte-Carlo simulation of SEM images for metrology

    Verduin, T., Lokhorst, S. R. & Hagen, C. W., 2016, Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XXX. Sanchez, M. I. & Ukraintsev, V. A. (eds.). SPIE, Vol. 9778. 15 p. 97780D

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  7. Sensitivity of secondary electron yields and SEM images to scattering parameters in MC simulations

    Verduin, T., Lokhorst, S. R., Hagen, C. W. & Kruit, P., 2016, In : Microelectronic Engineering. 155, p. 114-117

    Research output: Contribution to journalArticleScientificpeer-review

  8. Simulation of shotnoise induced side-wall roughness in electron lithography

    Verduin, T., Lokhorst, S. R., Hagen, C. W. & Kruit, P., 2016, Metrology, Inspection, and Process Control for Microlithography XXX. Sanchez, M. I. & Ukraintsev, V. A. (eds.). SPIE, Vol. 9778. 97781Z. (Proceedings of SPIE; vol. 9778).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  9. 2015
  10. The effect of sidewall roughness on line edge roughness in top-down scanning electron microscopy images

    Verduin, T., Lokhorst, SR., Kruit, P. & Hagen, CW., 2015, Metrology, Inspection, and Process Control for Microlithography XXIX. Cain, JP. & Sanchez, MI. (eds.). Bellingham, WA, USA: SPIE, p. 1-18 18 p. (Proceedings of SPIE- International Society for Optical Engineering; vol. 9424).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  11. 2014
  12. Determination of line edge roughness in low-dose top-down scanning electron microscopy images

    Verduin, T., Kruit, P. & Hagen, CW., 2014, In : Proceedings of SPIE- International Society for Optical Engineering. 9050, p. 1-3 3 p.

    Research output: Contribution to journalConference articleScientificpeer-review

  13. Determination of line edge roughness in low-dose top-down scanning electron microscopy images

    Verduin, T., Kruit, P. & Hagen, CW., 2014, In : Journal of Micro/Nanolithography, MEMS, and MOEMS. 13, 3, p. 1-10 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

  14. Size and Shape Control of Sub-20 nm Patterns Fabricated Using Focused Electron Beam Induced Processing

    Hari, S., Hagen, CW., Verduin, T. & Kruit, P., 2014, In : Journal of Micro/Nanolithography, MEMS, and MOEMS. 13, 3, p. 1-7 7 p.

    Research output: Contribution to journalArticleScientificpeer-review

  15. Size and Shape Control of Sub-20 nm Patterns Fabricated Using Focused Electron Beam Induced Processing

    Hari, S., Hagen, CW., Verduin, T. & Kruit, P., 2014, Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490M. Resnick, D. J. & Bencher, C. (eds.). s.n.: SPIE, p. 1-4 4 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

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