TY - JOUR
T1 - A high-current scanning electron microscope with multi-beam optics
AU - Doi, Takashi
AU - Yamazaki, Minoru
AU - Ichimura, Takashi
AU - Ren, Yan
AU - Kruit, P.
PY - 2016
Y1 - 2016
N2 - Recently we have proposed a new Multi-beam Scanning Electron Microscope (MBSEM) which potentially offers a higher current than a single beam SEM. In this system the primary electron beam is first separated into 196 beams by an Aperture Lens Array and then focused into one single spot by using a second Micro Lens Array (MLA) in the objective lens. This system potentially offers high current (200 nA), medium resolution (50 nm), and low landing energy (500 eV) for inspection tool of semiconductor. Here we report that we have achieved a practical setup, evaluated its performance, found difficulties in operating such a system and we draw conclusions about our proposition.
AB - Recently we have proposed a new Multi-beam Scanning Electron Microscope (MBSEM) which potentially offers a higher current than a single beam SEM. In this system the primary electron beam is first separated into 196 beams by an Aperture Lens Array and then focused into one single spot by using a second Micro Lens Array (MLA) in the objective lens. This system potentially offers high current (200 nA), medium resolution (50 nm), and low landing energy (500 eV) for inspection tool of semiconductor. Here we report that we have achieved a practical setup, evaluated its performance, found difficulties in operating such a system and we draw conclusions about our proposition.
KW - MEMS
KW - Multi-beam SEM (MBSEM)
KW - Scanning electron microscopy (SEM)
UR - http://www.scopus.com/inward/record.url?scp=84961157536&partnerID=8YFLogxK
U2 - 10.1016/j.mee.2016.02.055
DO - 10.1016/j.mee.2016.02.055
M3 - Article
AN - SCOPUS:84961157536
SN - 0167-9317
VL - 159
SP - 132
EP - 138
JO - Microelectronic Engineering
JF - Microelectronic Engineering
ER -