Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.

Original languageEnglish
Pages (from-to)28-34
Number of pages7
JournalThin Solid Films
Publication statusPublished - Jul 2015

    Research areas

  • Atomic layer deposition, Hydrogen evolution, Nanoparticles, Platinum, Thin films, Water splitting

ID: 30087969