Abstract
Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.
Original language | English |
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Pages (from-to) | 28-34 |
Number of pages | 7 |
Journal | Thin Solid Films |
Volume | 586 |
DOIs | |
Publication status | Published - Jul 2015 |
Keywords
- Atomic layer deposition
- Hydrogen evolution
- Nanoparticles
- Platinum
- Thin films
- Water splitting