A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors

Sten Vollebregt; B. Alfano; F. Ricciardella; A.J.M. Giesbers; Yelena Grachova; Henk van Zeijl; T Polichetti; Lina Sarro

doi:10.1109/MEMSYS.2016.7421546

A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors

Sten Vollebregt, B. Alfano, F. Ricciardella, A.J.M. Giesbers, Yelena Grachova, Henk van Zeijl, T Polichetti, Lina Sarro

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

19 Citations (Scopus)

Abstract

In this paper we report a novel transfer-free graphene fabrication process, which does not damage the graphene layer. Uniform graphene layers on 4" silicon wafers were deposited by chemical vapor deposition using the CMOS compatible Mo catalyst. Removal of the Mo layer after graphene deposition results in a transfer-free and controlled placement of the graphene on the underlying SiO2. Moreover, pre-patterning the Mo layer allows customizable graphene geometries to be directly obtained, something that has never been achieved before. This process is extremely suitable for the large-scale fabrication of MEMS/NEMS sensors, especially those benefitting from specific properties of graphene, such as gas sensing.

Original language	English
Title of host publication	2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS)
Place of Publication	Piscataway, NJ
Publisher	IEEE
Pages	17-20
Number of pages	4
ISBN (Electronic)	978-1-5090-1973-1
DOIs	https://doi.org/10.1109/MEMSYS.2016.7421546
Publication status	Published - Jan 2016
Event	MEMS 2016: 29th IEEE International Conference on Micro Electro Mechanical Systems - Shanghai, China Duration: 24 Jan 2016 → 28 Jan 2016 Conference number: 29

Conference

Conference	MEMS 2016
Country/Territory	China
City	Shanghai
Period	24/01/16 → 28/01/16

Keywords

Silicon
Graphene
Substrates
Micromechanical devices
Fabrication
Wet etching
Electrodes

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10.1109/MEMSYS.2016.7421546

Cite this

@inproceedings{e9e19132719d4445b861a56ab8aebe7c,

title = "A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors",

abstract = "In this paper we report a novel transfer-free graphene fabrication process, which does not damage the graphene layer. Uniform graphene layers on 4{"} silicon wafers were deposited by chemical vapor deposition using the CMOS compatible Mo catalyst. Removal of the Mo layer after graphene deposition results in a transfer-free and controlled placement of the graphene on the underlying SiO2. Moreover, pre-patterning the Mo layer allows customizable graphene geometries to be directly obtained, something that has never been achieved before. This process is extremely suitable for the large-scale fabrication of MEMS/NEMS sensors, especially those benefitting from specific properties of graphene, such as gas sensing.",

keywords = "Silicon, Graphene, Substrates, Micromechanical devices, Fabrication, Wet etching, Electrodes",

author = "Sten Vollebregt and B. Alfano and F. Ricciardella and A.J.M. Giesbers and Yelena Grachova and {van Zeijl}, Henk and T Polichetti and Lina Sarro",

year = "2016",

month = jan,

doi = "10.1109/MEMSYS.2016.7421546",

language = "English",

pages = "17--20",

booktitle = "2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS)",

publisher = "IEEE",

address = "United States",

note = "MEMS 2016 : 29th IEEE International Conference on Micro Electro Mechanical Systems ; Conference date: 24-01-2016 Through 28-01-2016",

}

Vollebregt, S, Alfano, B, Ricciardella, F, Giesbers, AJM, Grachova, Y , van Zeijl, H, Polichetti, T & Sarro, L 2016, A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors. in 2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS). IEEE, Piscataway, NJ, pp. 17-20, MEMS 2016, Shanghai, China, 24/01/16. https://doi.org/10.1109/MEMSYS.2016.7421546

A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors. / Vollebregt, Sten; Alfano, B.; Ricciardella, F. et al.
2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS). Piscataway, NJ: IEEE, 2016. p. 17-20.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors

AU - Vollebregt, Sten

AU - Alfano, B.

AU - Ricciardella, F.

AU - Giesbers, A.J.M.

AU - Grachova, Yelena

AU - van Zeijl, Henk

AU - Polichetti, T

AU - Sarro, Lina

N1 - Conference code: 29

PY - 2016/1

Y1 - 2016/1

N2 - In this paper we report a novel transfer-free graphene fabrication process, which does not damage the graphene layer. Uniform graphene layers on 4" silicon wafers were deposited by chemical vapor deposition using the CMOS compatible Mo catalyst. Removal of the Mo layer after graphene deposition results in a transfer-free and controlled placement of the graphene on the underlying SiO2. Moreover, pre-patterning the Mo layer allows customizable graphene geometries to be directly obtained, something that has never been achieved before. This process is extremely suitable for the large-scale fabrication of MEMS/NEMS sensors, especially those benefitting from specific properties of graphene, such as gas sensing.

AB - In this paper we report a novel transfer-free graphene fabrication process, which does not damage the graphene layer. Uniform graphene layers on 4" silicon wafers were deposited by chemical vapor deposition using the CMOS compatible Mo catalyst. Removal of the Mo layer after graphene deposition results in a transfer-free and controlled placement of the graphene on the underlying SiO2. Moreover, pre-patterning the Mo layer allows customizable graphene geometries to be directly obtained, something that has never been achieved before. This process is extremely suitable for the large-scale fabrication of MEMS/NEMS sensors, especially those benefitting from specific properties of graphene, such as gas sensing.

KW - Silicon

KW - Graphene

KW - Substrates

KW - Micromechanical devices

KW - Fabrication

KW - Wet etching

KW - Electrodes

U2 - 10.1109/MEMSYS.2016.7421546

DO - 10.1109/MEMSYS.2016.7421546

M3 - Conference contribution

SP - 17

EP - 20

BT - 2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS)

PB - IEEE

CY - Piscataway, NJ

T2 - MEMS 2016

Y2 - 24 January 2016 through 28 January 2016

ER -

A transfer-free wafer-scale CVD graphene fabrication process for MEMS/NEMS sensors

Abstract

Conference

Keywords

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