An analytical kinetic model for chemical-vapor deposition of pureB layers from diborane

V Mohammadi; WB De Boer; LK Nanver

doi:10.1063/1.4767328

An analytical kinetic model for chemical-vapor deposition of pureB layers from diborane

V Mohammadi, WB De Boer, LK Nanver

Electronic Components, Technology and Materials

Research output: Contribution to journal › Article › Scientific › peer-review

21 Citations (Scopus)

Original language	English
Pages (from-to)	1-10
Number of pages	10
Journal	Journal of Applied Physics
Volume	112
Issue number	11
DOIs	https://doi.org/10.1063/1.4767328
Publication status	Published - 2012

Bibliographical note

Published online: 3 december 2012

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10.1063/1.4767328

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title = "An analytical kinetic model for chemical-vapor deposition of pureB layers from diborane",

author = "V Mohammadi and {De Boer}, WB and LK Nanver",

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AU - Mohammadi, V

AU - De Boer, WB

AU - Nanver, LK

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PY - 2012

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JF - Journal of Applied Physics

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ER -

An analytical kinetic model for chemical-vapor deposition of pureB layers from diborane

Bibliographical note

Access to Document

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Cite this