An optimization approach for 3D photolithography utilizing DMD maskless exposure system

X Ma, Y Kato, Y Hirai, FCM van Kempen, F van Keulen, T Tsuchiya, O Tabata

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	English
Title of host publication	Proceedings of the 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies
Editors	Y-J Kim, W-Y Chung, et al
Place of Publication	Korea
Publisher	Korean Sensors Society
Pages	1-6
Number of pages	6
Publication status	Published - 2014
Event	APCOT 2014, Daegu, Korea - Korea Duration: 29 Jun 2014 → 2 Jul 2014

Name
Publisher	Korean Sensors Society

Conference	APCOT 2014, Daegu, Korea
Period	29/06/14 → 2/07/14

Cite this

@inproceedings{d51bb1be71db47b8b4200da069253ac5,

title = "An optimization approach for 3D photolithography utilizing DMD maskless exposure system",

author = "X Ma and Y Kato and Y Hirai and {van Kempen}, FCM and {van Keulen}, F and T Tsuchiya and O Tabata",

year = "2014",

language = "English",

publisher = "Korean Sensors Society",

pages = "1--6",

editor = "Y-J Kim and W-Y Chung and {et al}",

booktitle = "Proceedings of the 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies",

note = "APCOT 2014, Daegu, Korea ; Conference date: 29-06-2014 Through 02-07-2014",

}

Ma, X, Kato, Y, Hirai, Y, van Kempen, FCM, van Keulen, F, Tsuchiya, T & Tabata, O 2014, An optimization approach for 3D photolithography utilizing DMD maskless exposure system. in Y-J Kim, W-Y Chung & et al (eds), Proceedings of the 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies. Korean Sensors Society, Korea, pp. 1-6, APCOT 2014, Daegu, Korea, 29/06/14.

An optimization approach for 3D photolithography utilizing DMD maskless exposure system. / Ma, X; Kato, Y; Hirai, Y et al.
Proceedings of the 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies. ed. / Y-J Kim; W-Y Chung; et al. Korea: Korean Sensors Society, 2014. p. 1-6.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - An optimization approach for 3D photolithography utilizing DMD maskless exposure system

AU - Ma, X

AU - Kato, Y

AU - Hirai, Y

AU - van Kempen, FCM

AU - van Keulen, F

AU - Tsuchiya, T

AU - Tabata, O

PY - 2014

Y1 - 2014

M3 - Conference contribution

SP - 1

EP - 6

BT - Proceedings of the 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies

A2 - Kim, Y-J

A2 - Chung, W-Y

A2 - et al, null

PB - Korean Sensors Society

CY - Korea

T2 - APCOT 2014, Daegu, Korea

Y2 - 29 June 2014 through 2 July 2014

ER -