As peaks in Si (100) films fabricated with rapid thermal epitaxy

WD van Noort, LK Nanver, CCG Visser, A van Bogaard, JW Slotboom

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Proceedings Volume 99-10
Place of Publication	New Jersey
Publisher	The Electrochemical Society
Pages	335-342
Number of pages	8
ISBN (Print)	1-56677-232-X
Publication status	Published - 1999
Event	International Symposium on Advances in Rapid Thermal Processing, Seattle - New Jersey Duration: 2 May 1999 → 6 May 1999

Name
Publisher	the Electrochemical Society

Conference	International Symposium on Advances in Rapid Thermal Processing, Seattle
Period	2/05/99 → 6/05/99

Keywords

@inproceedings{c7e888e37f684e00b2fee7b671e14a46,

title = "As peaks in Si (100) films fabricated with rapid thermal epitaxy",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "{van Noort}, WD and LK Nanver and CCG Visser and {van Bogaard}, A and JW Slotboom",

year = "1999",

language = "Undefined/Unknown",

isbn = "1-56677-232-X",

publisher = "The Electrochemical Society",

pages = "335--342",

booktitle = "Proceedings Volume 99-10",

note = "International Symposium on Advances in Rapid Thermal Processing, Seattle ; Conference date: 02-05-1999 Through 06-05-1999",

}

TY - GEN

T1 - As peaks in Si (100) films fabricated with rapid thermal epitaxy

AU - van Noort, WD

AU - Nanver, LK

AU - Visser, CCG

AU - van Bogaard, A

AU - Slotboom, JW

PY - 1999

Y1 - 1999

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 1-56677-232-X

SP - 335

EP - 342

BT - Proceedings Volume 99-10

PB - The Electrochemical Society

CY - New Jersey

T2 - International Symposium on Advances in Rapid Thermal Processing, Seattle

Y2 - 2 May 1999 through 6 May 1999

ER -