Benchmarking Gate Fidelities in a Si/SiGe Two-Qubit Device

X. Xue, T. F. Watson, J. Helsen, D. R. Ward, D. E. Savage, M. G. Lagally, S. N. Coppersmith, M. A. Eriksson, S. Wehner, L. M.K. Vandersypen*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

103 Citations (Scopus)
98 Downloads (Pure)

Abstract

We report the first complete characterization of single-qubit and two-qubit gate fidelities in silicon-based spin qubits, including cross talk and error correlations between the two qubits. To do so, we use a combination of standard randomized benchmarking and a recently introduced method called character randomized benchmarking, which allows for more reliable estimates of the two-qubit fidelity in this system, here giving a 92% fidelity estimate for the controlled-Z gate. Interestingly, with character randomized benchmarking, the two-qubit gate fidelity can be obtained by studying the additional decay induced by interleaving the two-qubit gate in a reference sequence of single-qubit gates only. This work sets the stage for further improvements in all the relevant gate fidelities in silicon spin qubits beyond the error threshold for fault-tolerant quantum computation.

Original languageEnglish
Article number021011
Number of pages12
JournalPhysical Review X
Volume9
Issue number2
DOIs
Publication statusPublished - 2019

Fingerprint

Dive into the research topics of 'Benchmarking Gate Fidelities in a Si/SiGe Two-Qubit Device'. Together they form a unique fingerprint.

Cite this