Abstract
Cryogenic characterization and modeling of two nanometer bulk CMOS technologies (0.16-μm and 40-nm) are presented in this paper. Several devices from both technologies were extensively characterized at temperatures of 4 K and below. Based on a detailed understanding of the device physics at deep-cryogenic temperatures, a compact model based on MOS11 and PSP was developed. In addition to reproducing the device DC characteristics, the accuracy and validity of the compact models are demonstrated by comparing time-and frequency-domain simulations of complex circuits, such as a ring oscillator and a low-noise amplifier (LNA), with the measurements at 4 K.
Original language | English |
---|---|
Number of pages | 11 |
Journal | IEEE Journal of the Electron Devices Society |
Volume | 6 |
DOIs | |
Publication status | Published - 2018 |
Keywords
- 4 K
- characterization
- CMOS
- CMOS technology
- cryo-CMOS
- cryogenic
- Cryogenic electronics
- Cryogenics
- Integrated circuit modeling
- kink
- LNA.
- modeling
- MOS devices
- Quantum computing
- Semiconductor device modeling