Characterization of defects at the Si/SiO2 interface of a polysilicon-gated MOS system by monoenergetic positrons

M Clement, JMM de Nijs, H Schut, A van Veen

    Research output: Contribution to journalArticleProfessional

    Original languageUndefined/Unknown
    Pages (from-to)718-720
    Number of pages3
    JournalMaterials Science Forum
    Volume255
    Issue number257
    Publication statusPublished - 1997

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