Chemical-mechanical relationship of amorphous/porous low-dielectric film materials

CA Yuan, O van der Sluis, GQ Zhang, LJ Ernst, WD van Driel, RBR van Silfhout, BJ Thijsse

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	606-613
Number of pages	8
Journal	Computational Materials Science
Volume	42
DOIs	https://doi.org/doi:10.1016/j.commatsci.2007.09.
Publication status	Published - 2007

NEO

Keywords

@article{b604f79f591d4af29ac346857341b3ae,

title = "Chemical-mechanical relationship of amorphous/porous low-dielectric film materials",

keywords = "CWTS 0.75 <= JFIS < 2.00",

author = "CA Yuan and {van der Sluis}, O and GQ Zhang and LJ Ernst and {van Driel}, WD and {van Silfhout}, RBR and BJ Thijsse",

note = "NEO",

year = "2007",

doi = "doi:10.1016/j.commatsci.2007.09.",

language = "Undefined/Unknown",

volume = "42",

pages = "606--613",

journal = "Computational Materials Science",

issn = "0927-0256",

publisher = "Elsevier",

}

TY - JOUR

T1 - Chemical-mechanical relationship of amorphous/porous low-dielectric film materials

AU - Yuan, CA

AU - van der Sluis, O

AU - Zhang, GQ

AU - Ernst, LJ

AU - van Driel, WD

AU - van Silfhout, RBR

AU - Thijsse, BJ

N1 - NEO

PY - 2007

Y1 - 2007

KW - CWTS 0.75 <= JFIS < 2.00

U2 - doi:10.1016/j.commatsci.2007.09.

DO - doi:10.1016/j.commatsci.2007.09.

M3 - Article

SN - 0927-0256

VL - 42

SP - 606

EP - 613

JO - Computational Materials Science

JF - Computational Materials Science

ER -