‘Cleanroom’ in SEM

G. Jeevanandam*, V. van der Meijden, L. D. Birnie, P. Kruit, C. W. Hagen

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)
91 Downloads (Pure)

Abstract

To allow researchers to fabricate micro- and nano-devices on a small scale, without having to use complex cleanroom facilities, a single tool is proposed in which a variety of typical cleanroom techniques and processes is combined. This ‘cleanroom’ in SEM tool, based on a scanning electron microscope (SEM), integrates several add-on tools, such as a miniature plasma source for sputtering and cleaning purposes, a miniature thermal evaporator for metal deposition, and facilities to enable in-situ selective atomic layer deposition. The cleanroom techniques and processes selected for integration in the ‘cleanroom’ in SEM tool are discussed, and the design and fabrication of the add-on tools are presented. Finally the proofs of principle of the plasma source, evaporator and in-situ selective ALD process are experimentally demonstrated.

Original languageEnglish
Article number111239
Number of pages7
JournalMicroelectronic Engineering
Volume224
DOIs
Publication statusPublished - 2020

Bibliographical note

Green Open Access added to TU Delft Institutional Repository ‘You share, we take care!’ – Taverne project https://www.openaccess.nl/en/you-share-we-take-care Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.

Keywords

  • Nanofabrication
  • SEM
  • Sputter etching
  • Thermal evaporation

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  • Cleanroom in an SEM

    Jeevanandam, G., 2024

    Research output: ThesisDissertation (TU Delft)

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