@article{08e9f0395b5a45c4b5a49ff30a0a294a,
title = "Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP",
keywords = "academic journal papers, CWTS 0.75 <= JFIS < 2.00",
author = "CF Carlstrom and {van der Heijden}, R and MSP Andriesse and F Karouta and {van der Heijden}, RW and {van der Drift}, EWJM and HWM Salemink",
year = "2008",
language = "Undefined/Unknown",
volume = "26",
pages = "1675--1683",
journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "5",
}