Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

CF Carlstrom, R van der Heijden, MSP Andriesse, F Karouta, RW van der Heijden, EWJM van der Drift, HWM Salemink

Research output: Contribution to journalArticleScientificpeer-review

18 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)1675-1683
Number of pages9
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume26
Issue number5
Publication statusPublished - 2008

Keywords

  • academic journal papers
  • CWTS 0.75 <= JFIS < 2.00

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