Copper for IC-applications. Mechanical reliability of CVD copper films

JF Jongste, JP Lokker, GCAM Janssen, S Radelaar

    Research output: Book/ReportReportProfessional

    Original languageUndefined/Unknown
    Place of PublicationDelft
    PublisherTechnische Universiteit Delft
    Number of pages11
    Publication statusPublished - 1996

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    PublisherTechnische Universiteit Delft

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