Original language | Undefined/Unknown |
---|---|
Pages (from-to) | 81-84 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 30 |
Publication status | Published - 1996 |
DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device
BJ Vleeming, JTLR Leene, EWJM van der Drift, J Romijn
Research output: Contribution to journal › Article › Scientific › peer-review
8
Citations
(Scopus)