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Electrical characteristics of plasma-enhanced chemical vapor deposited silicon carbide thin films. / Pham, TMH; Akkaya, T; de Boer, CR; Sarro, PM.

In: Materials Science Forum, Vol. 433/436, 2003, p. 451-454.

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Pham, TMH ; Akkaya, T ; de Boer, CR ; Sarro, PM. / Electrical characteristics of plasma-enhanced chemical vapor deposited silicon carbide thin films. In: Materials Science Forum. 2003 ; Vol. 433/436. pp. 451-454.

BibTeX

@article{f51c6033fc60482fafb17f1309795c1f,
title = "Electrical characteristics of plasma-enhanced chemical vapor deposited silicon carbide thin films",
keywords = "Elektrotechniek, Techniek, ZX CWTS JFIS < 1.00",
author = "TMH Pham and T Akkaya and {de Boer}, CR and PM Sarro",
year = "2003",
language = "Undefined/Unknown",
volume = "433/436",
pages = "451--454",
journal = "Materials Science Forum",
issn = "0255-5476",
publisher = "Trans Tech Publications",

}

RIS

TY - JOUR

T1 - Electrical characteristics of plasma-enhanced chemical vapor deposited silicon carbide thin films

AU - Pham, TMH

AU - Akkaya, T

AU - de Boer, CR

AU - Sarro, PM

PY - 2003

Y1 - 2003

KW - Elektrotechniek

KW - Techniek

KW - ZX CWTS JFIS < 1.00

M3 - Article

VL - 433/436

SP - 451

EP - 454

JO - Materials Science Forum

T2 - Materials Science Forum

JF - Materials Science Forum

SN - 0255-5476

ER -

ID: 3968569