Electromigration in short Al lines studied by high-resolution resistance measurement

AH Verbruggen, MJC van de Homberg, LC Jacobs, AJ Kalkman, JR Kraayeveld, S Radelaar

    Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

    3 Citations (Scopus)
    Original languageUndefined/Unknown
    Title of host publicationMRS Symp. Proc. Materials Reliability in Microelectronics VII
    EditorsJ Clement, R Keller, K Krisch, J Sanchez, Z Suo
    Pages255-266
    Number of pages12
    Publication statusPublished - 1997

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