Etching and passivation of silicon in alkaline solution: a coupled chemical/electrochemical system

XH Xia, CMA Ashruf, PJ French, J Rappich, JJ Kelly

Research output: Contribution to journal › Article › Scientific

Original language	Undefined/Unknown
Pages (from-to)	5722-5729
Number of pages	8
Journal	The Journal of Physical Chemistry Part B (Biophysical Chemistry, Biomaterials, Liquids, and Soft Matter)
Volume	105
Publication status	Published - 2001

Keywords

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title = "Etching and passivation of silicon in alkaline solution: a coupled chemical/electrochemical system",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "XH Xia and CMA Ashruf and PJ French and J Rappich and JJ Kelly",

year = "2001",

language = "Undefined/Unknown",

volume = "105",

pages = "5722--5729",

journal = "The Journal of Physical Chemistry Part B (Biophysical Chemistry, Biomaterials, Liquids, and Soft Matter)",

issn = "1520-6106",

publisher = "American Chemical Society (ACS)",

}

TY - JOUR

T1 - Etching and passivation of silicon in alkaline solution: a coupled chemical/electrochemical system

AU - Xia, XH

AU - Ashruf, CMA

AU - French, PJ

AU - Rappich, J

AU - Kelly, JJ

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 1520-6106

VL - 105

SP - 5722

EP - 5729

JO - The Journal of Physical Chemistry Part B (Biophysical Chemistry, Biomaterials, Liquids, and Soft Matter)

JF - The Journal of Physical Chemistry Part B (Biophysical Chemistry, Biomaterials, Liquids, and Soft Matter)

ER -