Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers

HJ Voorma; E Louis; NB Koster; LA Smaenok; F Bijkerk; T Zijlstra; LEM de Groot; EWJM van der Drift; BAC Rousseeuw; J Romijn; J Friedrich

Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers

HJ Voorma, E Louis, NB Koster, LA Smaenok, F Bijkerk, T Zijlstra, LEM de Groot, EWJM van der Drift, BAC Rousseeuw, J Romijn, J Friedrich

QN/Kavli Nanolab Delft

Research output: Contribution to journal › Article › Scientific › peer-review

4 Citations (Scopus)

Original language	Undefined/Unknown
Pages (from-to)	293-298
Number of pages	6
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	15
Publication status	Published - 1997

Cite this

Voorma, HJ., Louis, E., Koster, NB., Smaenok, LA., Bijkerk, F., Zijlstra, T., de Groot, LEM., van der Drift, EWJM., Rousseeuw, BAC., Romijn, J., & Friedrich, J. (1997). Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers. Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures, 15, 293-298.

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title = "Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers",

author = "HJ Voorma and E Louis and NB Koster and LA Smaenok and F Bijkerk and T Zijlstra and {de Groot}, LEM and {van der Drift}, EWJM and BAC Rousseeuw and J Romijn and J Friedrich",

year = "1997",

language = "Undefined/Unknown",

volume = "15",

pages = "293--298",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

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Voorma, HJ, Louis, E, Koster, NB, Smaenok, LA, Bijkerk, F, Zijlstra, T, de Groot, LEM, van der Drift, EWJM, Rousseeuw, BAC, Romijn, J & Friedrich, J 1997, 'Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers', Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures, vol. 15, pp. 293-298.

TY - JOUR

T1 - Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers

AU - Voorma, HJ

AU - Louis, E

AU - Koster, NB

AU - Smaenok, LA

AU - Bijkerk, F

AU - Zijlstra, T

AU - de Groot, LEM

AU - van der Drift, EWJM

AU - Rousseeuw, BAC

AU - Romijn, J

AU - Friedrich, J

PY - 1997

Y1 - 1997

M3 - Article

SN - 1071-1023

VL - 15

SP - 293

EP - 298

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

ER -