Original language | Undefined/Unknown |
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Pages (from-to) | 293-298 |
Number of pages | 6 |
Journal | Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures |
Volume | 15 |
Publication status | Published - 1997 |
Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers
HJ Voorma, E Louis, NB Koster, LA Smaenok, F Bijkerk, T Zijlstra, LEM de Groot, EWJM van der Drift, BAC Rousseeuw, J Romijn, J Friedrich
Research output: Contribution to journal › Article › Scientific › peer-review
4
Citations
(Scopus)