DOI

We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.

Original languageEnglish
Title of host publicationProceedings of SPIE Micro-Optics 2016
EditorsHugo Thienpont, Jürgen Mohr, Hans Zappe, Hirochika Nakajima
Place of PublicationBellingham, WA
PublisherSPIE
Pages98880C-1/98888C-10
Number of pages10
ISBN (Electronic)9781510601338
DOIs
Publication statusPublished - 2016
EventMicro-Optics 2016 - Brussels, Belgium
Duration: 3 Apr 20163 Apr 2016

Publication series

NameProceedings of SPIE
PublisherSPIE
Number9888
ISSN (Electronic)0277-786X

Conference

ConferenceMicro-Optics 2016
CountryBelgium
CityBrussels
Period3/04/163/04/16

    Research areas

  • fabrication, Si microlenses, thermal photoresist reflow

ID: 29539009