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Fabrication process of Si microlenses for OCT systems. / Jovic, A.; Pandraud, G.; Zinoviev, Kirill; Rubio, Jose L.; Margallo, E; Sarro, Lina.

Proceedings of SPIE Micro-Optics 2016. ed. / Hugo Thienpont; Jürgen Mohr; Hans Zappe; Hirochika Nakajima. Bellingham, WA : SPIE, 2016. p. 98880C-1/98888C-10 98880C (Proceedings of SPIE; No. 9888).

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Harvard

Jovic, A, Pandraud, G, Zinoviev, K, Rubio, JL, Margallo, E & Sarro, L 2016, Fabrication process of Si microlenses for OCT systems. in H Thienpont, J Mohr, H Zappe & H Nakajima (eds), Proceedings of SPIE Micro-Optics 2016., 98880C, Proceedings of SPIE, no. 9888, SPIE, Bellingham, WA, pp. 98880C-1/98888C-10, Micro-Optics 2016, Brussels, Belgium, 3/04/16. https://doi.org/10.1117/12.2227898

APA

Jovic, A., Pandraud, G., Zinoviev, K., Rubio, J. L., Margallo, E., & Sarro, L. (2016). Fabrication process of Si microlenses for OCT systems. In H. Thienpont, J. Mohr, H. Zappe, & H. Nakajima (Eds.), Proceedings of SPIE Micro-Optics 2016 (pp. 98880C-1/98888C-10). [98880C] (Proceedings of SPIE; No. 9888). SPIE. https://doi.org/10.1117/12.2227898

Vancouver

Jovic A, Pandraud G, Zinoviev K, Rubio JL, Margallo E, Sarro L. Fabrication process of Si microlenses for OCT systems. In Thienpont H, Mohr J, Zappe H, Nakajima H, editors, Proceedings of SPIE Micro-Optics 2016. Bellingham, WA: SPIE. 2016. p. 98880C-1/98888C-10. 98880C. (Proceedings of SPIE; 9888). https://doi.org/10.1117/12.2227898

Author

Jovic, A. ; Pandraud, G. ; Zinoviev, Kirill ; Rubio, Jose L. ; Margallo, E ; Sarro, Lina. / Fabrication process of Si microlenses for OCT systems. Proceedings of SPIE Micro-Optics 2016. editor / Hugo Thienpont ; Jürgen Mohr ; Hans Zappe ; Hirochika Nakajima. Bellingham, WA : SPIE, 2016. pp. 98880C-1/98888C-10 (Proceedings of SPIE; 9888).

BibTeX

@inproceedings{cec4bee5efb843ecbb410726f23b8d5f,
title = "Fabrication process of Si microlenses for OCT systems",
abstract = "We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.",
keywords = "fabrication, Si microlenses, thermal photoresist reflow",
author = "A. Jovic and G. Pandraud and Kirill Zinoviev and Rubio, {Jose L.} and E Margallo and Lina Sarro",
year = "2016",
doi = "10.1117/12.2227898",
language = "English",
series = "Proceedings of SPIE",
publisher = "SPIE",
number = "9888",
pages = "98880C--1/98888C--10",
editor = "Hugo Thienpont and J{\"u}rgen Mohr and Hans Zappe and Hirochika Nakajima",
booktitle = "Proceedings of SPIE Micro-Optics 2016",
address = "United States",
note = "Micro-Optics 2016 ; Conference date: 03-04-2016 Through 03-04-2016",

}

RIS

TY - GEN

T1 - Fabrication process of Si microlenses for OCT systems

AU - Jovic, A.

AU - Pandraud, G.

AU - Zinoviev, Kirill

AU - Rubio, Jose L.

AU - Margallo, E

AU - Sarro, Lina

PY - 2016

Y1 - 2016

N2 - We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.

AB - We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.

KW - fabrication

KW - Si microlenses

KW - thermal photoresist reflow

UR - http://www.scopus.com/inward/record.url?scp=84991455947&partnerID=8YFLogxK

U2 - 10.1117/12.2227898

DO - 10.1117/12.2227898

M3 - Conference contribution

AN - SCOPUS:84991455947

T3 - Proceedings of SPIE

SP - 98880C-1/98888C-10

BT - Proceedings of SPIE Micro-Optics 2016

A2 - Thienpont, Hugo

A2 - Mohr, Jürgen

A2 - Zappe, Hans

A2 - Nakajima, Hirochika

PB - SPIE

CY - Bellingham, WA

T2 - Micro-Optics 2016

Y2 - 3 April 2016 through 3 April 2016

ER -

ID: 29539009