High aspect ratio spiral resonators for process variation investigation and MEMS applications

L.M. Middelburg; B. El  Mansouri; H.W. Van Zeijl; G.Q. Zhang; R.H. Poelma

doi:10.1109/ICSENS.2017.8233945

High aspect ratio spiral resonators for process variation investigation and MEMS applications

L.M. Middelburg, B. El Mansouri, H.W. Van Zeijl, G.Q. Zhang, R.H. Poelma

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

35 Downloads (Pure)

Abstract

In this work a method is described to investigate process variations across a wafer. Through wafer MEMS spiral resonators were designed, simulated, fabricated and characterized by measuring the eigenfrequency and corresponding mode shapes. Measuring the eigenfrequency and resulting spectral behavior of resonators on different locations on the wafer was performed by using an optical measurement setup. Two laser beams were used where one is modulated by the periodic movement of the center mass of the resonator. One of the beams is reflected back from the modulated resonator and this beam hits a photo diode. Variations in light intensity due to movement of the resonator is providing a measurement signal correlated to movement. Preliminary measurements showed that measured eigenfrequencies are in correspondence with the simulations within a range of 0-10% deviation.

Original language	English
Title of host publication	Proceedings of IEEE Sensors Conference 2017
Place of Publication	Piscataway, NJ
Publisher	IEEE
Pages	1-3
Number of pages	3
ISBN (Electronic)	978-1-5090-1012-7
ISBN (Print)	978-1-5090-1013-4
DOIs	https://doi.org/10.1109/ICSENS.2017.8233945
Publication status	Published - 2017
Event	IEEE SENSORS 2017 - Glasgow, United Kingdom Duration: 29 Oct 2017 → 1 Nov 2017 http://ieee-sensors2017.org/

Conference

Conference	IEEE SENSORS 2017
Country/Territory	United Kingdom
City	Glasgow
Period	29/10/17 → 1/11/17
Internet address	http://ieee-sensors2017.org/

Bibliographical note

Accepted author manuscript

Keywords

bulk micromachining
DRIE etching
MEMS
process variations
Resonators

Access to Document

10.1109/ICSENS.2017.8233945

44904112 - Sensors2017_spiralresonators_final_v2_embAccepted author manuscript, 415 KB

Cite this

@inproceedings{39a87fe91aa543f3addf7535fc659b4d,

title = "High aspect ratio spiral resonators for process variation investigation and MEMS applications",

abstract = "In this work a method is described to investigate process variations across a wafer. Through wafer MEMS spiral resonators were designed, simulated, fabricated and characterized by measuring the eigenfrequency and corresponding mode shapes. Measuring the eigenfrequency and resulting spectral behavior of resonators on different locations on the wafer was performed by using an optical measurement setup. Two laser beams were used where one is modulated by the periodic movement of the center mass of the resonator. One of the beams is reflected back from the modulated resonator and this beam hits a photo diode. Variations in light intensity due to movement of the resonator is providing a measurement signal correlated to movement. Preliminary measurements showed that measured eigenfrequencies are in correspondence with the simulations within a range of 0-10% deviation.",

keywords = "bulk micromachining, DRIE etching, MEMS, process variations, Resonators",

author = "L.M. Middelburg and Mansouri, {B. El} and {Van Zeijl}, H.W. and G.Q. Zhang and R.H. Poelma",

note = "Accepted author manuscript; IEEE SENSORS 2017 ; Conference date: 29-10-2017 Through 01-11-2017",

year = "2017",

doi = "10.1109/ICSENS.2017.8233945",

language = "English",

isbn = "978-1-5090-1013-4",

pages = "1--3",

booktitle = "Proceedings of IEEE Sensors Conference 2017",

publisher = "IEEE",

address = "United States",

url = "http://ieee-sensors2017.org/",

}

TY - GEN

T1 - High aspect ratio spiral resonators for process variation investigation and MEMS applications

AU - Middelburg, L.M.

AU - Mansouri, B. El

AU - Van Zeijl, H.W.

AU - Zhang, G.Q.

AU - Poelma, R.H.

N1 - Accepted author manuscript

PY - 2017

Y1 - 2017

N2 - In this work a method is described to investigate process variations across a wafer. Through wafer MEMS spiral resonators were designed, simulated, fabricated and characterized by measuring the eigenfrequency and corresponding mode shapes. Measuring the eigenfrequency and resulting spectral behavior of resonators on different locations on the wafer was performed by using an optical measurement setup. Two laser beams were used where one is modulated by the periodic movement of the center mass of the resonator. One of the beams is reflected back from the modulated resonator and this beam hits a photo diode. Variations in light intensity due to movement of the resonator is providing a measurement signal correlated to movement. Preliminary measurements showed that measured eigenfrequencies are in correspondence with the simulations within a range of 0-10% deviation.

AB - In this work a method is described to investigate process variations across a wafer. Through wafer MEMS spiral resonators were designed, simulated, fabricated and characterized by measuring the eigenfrequency and corresponding mode shapes. Measuring the eigenfrequency and resulting spectral behavior of resonators on different locations on the wafer was performed by using an optical measurement setup. Two laser beams were used where one is modulated by the periodic movement of the center mass of the resonator. One of the beams is reflected back from the modulated resonator and this beam hits a photo diode. Variations in light intensity due to movement of the resonator is providing a measurement signal correlated to movement. Preliminary measurements showed that measured eigenfrequencies are in correspondence with the simulations within a range of 0-10% deviation.

KW - bulk micromachining

KW - DRIE etching

KW - MEMS

KW - process variations

KW - Resonators

UR - http://www.scopus.com/inward/record.url?scp=85044319485&partnerID=8YFLogxK

U2 - 10.1109/ICSENS.2017.8233945

DO - 10.1109/ICSENS.2017.8233945

M3 - Conference contribution

AN - SCOPUS:85044319485

SN - 978-1-5090-1013-4

SP - 1

EP - 3

BT - Proceedings of IEEE Sensors Conference 2017

PB - IEEE

CY - Piscataway, NJ

T2 - IEEE SENSORS 2017

Y2 - 29 October 2017 through 1 November 2017

ER -

High aspect ratio spiral resonators for process variation investigation and MEMS applications

Abstract

Conference

Bibliographical note

Keywords

Access to Document

Other files and links

Fingerprint

Cite this