High-temperature tensile tests and activation volume measurement of free-standing submicron Al films

AJ Kalkman, AH Verbruggen, S Radelaar

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{f3d0405b07d7419ea20f1f8801863e6f,

title = "High-temperature tensile tests and activation volume measurement of free-standing submicron Al films",

keywords = "academic journal papers, ZX CWTS 1.00 <= JFIS < 3.00",

author = "AJ Kalkman and AH Verbruggen and S Radelaar",

year = "2002",

language = "Undefined/Unknown",

volume = "92",

pages = "6612--6615",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "AIP Publishing",

number = "11",

}

TY - JOUR

T1 - High-temperature tensile tests and activation volume measurement of free-standing submicron Al films

AU - Kalkman, AJ

AU - Verbruggen, AH

AU - Radelaar, S

PY - 2002

Y1 - 2002

KW - academic journal papers

KW - ZX CWTS 1.00 <= JFIS < 3.00

M3 - Article

SN - 0021-8979

VL - 92

SP - 6612

EP - 6615

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

ER -