Lithographic alignment offset compensation for substrate transfer processes

HW van Zeijl, LK Nanver, FGC Bijnen, EJG Goudena, JHCM Slabbekoorn

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationProceedings of the STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005)
Editors s.n.
Place of PublicationUtrecht, The Netherlands
PublisherSTW
Pages121-126
Number of pages6
ISBN (Print)90-73461-50-2
Publication statusPublished - 2005
EventSTW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005), Veldhoven, the Netherlands - Utrecht
Duration: 17 Nov 200518 Nov 2005

Publication series

Name
PublisherSTW

Conference

ConferenceSTW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005), Veldhoven, the Netherlands
Period17/11/0518/11/05

Bibliographical note

Editors onbekend, WPM/STW

Keywords

  • conference contrib. refereed
  • Vakpubl., Overig wet. > 3 pag

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