Lithography system, sensor and measuring method

P Kruit (Inventor), E Slot (Inventor), TF Teepen (Inventor), MJJ Wieland (Inventor), SWHK Steenbrink (Inventor)

    Research output: Patent

    Original languageUndefined/Unknown
    Patent numberUS7868300B2
    IPCAanvrager: MAPPER Lithography B.V.
    Priority date11/01/11
    Publication statusPublished - 2011

    Bibliographical note

    Aanvrager: MAPPER Lithography B.V.

    Keywords

    • Octrooi

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