Lutetium coating of nanoparticles by atomic layer deposition

Josette L.T.M. Moret; Matthew B.E. Griffiths; Jeannine E.B.M. Frijns; Baukje E. Terpstra; Hubert T. Wolterbeek; Seán T. Barry; Antonia G. Denkova; J. Ruud Van Ommen

doi:10.1116/1.5134446

Lutetium coating of nanoparticles by atomic layer deposition

Josette L.T.M. Moret, Matthew B.E. Griffiths, Jeannine E.B.M. Frijns, Baukje E. Terpstra, Hubert T. Wolterbeek, Seán T. Barry, Antonia G. Denkova, J. Ruud Van Ommen

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Abstract

Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO₂ nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)₃ and the custom-made Lu(HMDS)₃. Using Lu(TMHD)₃, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)₃, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.

Original language	English
Article number	022414
Number of pages	8
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	38
Issue number	2
DOIs	https://doi.org/10.1116/1.5134446
Publication status	Published - 2020

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title = "Lutetium coating of nanoparticles by atomic layer deposition",

abstract = "Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO2 nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and the custom-made Lu(HMDS)3. Using Lu(TMHD)3, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)3, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.",

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AU - Moret, Josette L.T.M.

AU - Griffiths, Matthew B.E.

AU - Frijns, Jeannine E.B.M.

AU - Terpstra, Baukje E.

AU - Wolterbeek, Hubert T.

AU - Barry, Seán T.

AU - Denkova, Antonia G.

AU - Van Ommen, J. Ruud

N1 - Accepted Author Manuscript

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N2 - Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO2 nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and the custom-made Lu(HMDS)3. Using Lu(TMHD)3, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)3, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.

AB - Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO2 nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and the custom-made Lu(HMDS)3. Using Lu(TMHD)3, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)3, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.

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Lutetium coating of nanoparticles by atomic layer deposition

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