• 3904264

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In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.

Original languageEnglish
Article number065004
Pages (from-to)065004-1/065004-8
Number of pages8
JournalAIP Advances
Publication statusPublished - 2016

ID: 3904264