Abstract
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.
Original language | English |
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Article number | 065004 |
Pages (from-to) | 065004-1/065004-8 |
Number of pages | 8 |
Journal | AIP Advances |
Volume | 6 |
DOIs | |
Publication status | Published - 2016 |