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Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications. / Serra, E.; Bawaj, M.; Borrielli, A.; Di Giuseppe, G.; Forte, S.; Kralj, N.; Malossi, N.; Marconi, L.; Marin, F.; Marino, F.; Morana, B.; Natali, R.; Pandraud, G.; Pontin, A.; Prodi, G.A.; Rossi, M.; Sarro, P.M.; Vitali, D.; Bonaldi, M.

In: AIP Advances, Vol. 6, 065004, 2016, p. 065004-1/065004-8.

Research output: Contribution to journalArticleScientificpeer-review

Harvard

Serra, E, Bawaj, M, Borrielli, A, Di Giuseppe, G, Forte, S, Kralj, N, Malossi, N, Marconi, L, Marin, F, Marino, F, Morana, B, Natali, R, Pandraud, G, Pontin, A, Prodi, GA, Rossi, M, Sarro, PM, Vitali, D & Bonaldi, M 2016, 'Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications' AIP Advances, vol. 6, 065004, pp. 065004-1/065004-8. https://doi.org/10.1063/1.4953805

APA

Serra, E., Bawaj, M., Borrielli, A., Di Giuseppe, G., Forte, S., Kralj, N., ... Bonaldi, M. (2016). Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications. AIP Advances, 6, 065004-1/065004-8. [065004]. https://doi.org/10.1063/1.4953805

Vancouver

Author

Serra, E. ; Bawaj, M. ; Borrielli, A. ; Di Giuseppe, G. ; Forte, S. ; Kralj, N. ; Malossi, N. ; Marconi, L. ; Marin, F. ; Marino, F. ; Morana, B. ; Natali, R. ; Pandraud, G. ; Pontin, A. ; Prodi, G.A. ; Rossi, M. ; Sarro, P.M. ; Vitali, D. ; Bonaldi, M. / Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications. In: AIP Advances. 2016 ; Vol. 6. pp. 065004-1/065004-8.

BibTeX

@article{41b8ab3f1083454cbd29d137586bf6cd,
title = "Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications",
abstract = "In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-P{\'e}rot cavity, where an optical finesse up to 50000 has been observed.",
author = "E. Serra and M. Bawaj and A. Borrielli and {Di Giuseppe}, G. and S. Forte and N. Kralj and N. Malossi and L. Marconi and F. Marin and F. Marino and B. Morana and R. Natali and G. Pandraud and A. Pontin and G.A. Prodi and M. Rossi and P.M. Sarro and D. Vitali and M. Bonaldi",
year = "2016",
doi = "10.1063/1.4953805",
language = "English",
volume = "6",
pages = "065004--1/065004--8",
journal = "AIP Advances",
issn = "2158-3226",
publisher = "American Institute of Physics Publising LLC",

}

RIS

TY - JOUR

T1 - Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

AU - Serra, E.

AU - Bawaj, M.

AU - Borrielli, A.

AU - Di Giuseppe, G.

AU - Forte, S.

AU - Kralj, N.

AU - Malossi, N.

AU - Marconi, L.

AU - Marin, F.

AU - Marino, F.

AU - Morana, B.

AU - Natali, R.

AU - Pandraud, G.

AU - Pontin, A.

AU - Prodi, G.A.

AU - Rossi, M.

AU - Sarro, P.M.

AU - Vitali, D.

AU - Bonaldi, M.

PY - 2016

Y1 - 2016

N2 - In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.

AB - In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.

UR - http://arxiv.org/abs/1601.02669v1

UR - http://resolver.tudelft.nl/uuid:41b8ab3f-1083-454c-bd29-d137586bf6cd

U2 - 10.1063/1.4953805

DO - 10.1063/1.4953805

M3 - Article

VL - 6

SP - 065004-1/065004-8

JO - AIP Advances

T2 - AIP Advances

JF - AIP Advances

SN - 2158-3226

M1 - 065004

ER -

ID: 3904264