Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

E. Serra; M. Bawaj; A. Borrielli; G. Di Giuseppe; S. Forte; N. Kralj; N. Malossi; L. Marconi; F. Marin; F. Marino; B. Morana; R. Natali; G. Pandraud; A. Pontin; G.A. Prodi; M. Rossi; P.M. Sarro; D. Vitali; M. Bonaldi

doi:10.1063/1.4953805

Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

E. Serra, M. Bawaj, A. Borrielli, G. Di Giuseppe, S. Forte, N. Kralj, N. Malossi, L. Marconi, F. Marin, F. Marino, B. Morana, R. Natali, G. Pandraud, A. Pontin, G.A. Prodi, M. Rossi, P.M. Sarro, D. Vitali, M. Bonaldi

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Abstract

In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiN_x membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiN_x membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 10⁶ were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.

Original language	English
Article number	065004
Pages (from-to)	065004-1/065004-8
Number of pages	8
Journal	AIP Advances
Volume	6
DOIs	https://doi.org/10.1063/1.4953805
Publication status	Published - 2016

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Serra, E., Bawaj, M., Borrielli, A., Di Giuseppe, G., Forte, S., Kralj, N., Malossi, N., Marconi, L., Marin, F., Marino, F., Morana, B., Natali, R., Pandraud, G., Pontin, A., Prodi, G. A., Rossi, M., Sarro, P. M., Vitali, D., & Bonaldi, M. (2016). Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications. AIP Advances, 6, 065004-1/065004-8. Article 065004. https://doi.org/10.1063/1.4953805

@article{41b8ab3f1083454cbd29d137586bf6cd,

title = "Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications",

abstract = "In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-P{\'e}rot cavity, where an optical finesse up to 50000 has been observed.",

author = "E. Serra and M. Bawaj and A. Borrielli and {Di Giuseppe}, G. and S. Forte and N. Kralj and N. Malossi and L. Marconi and F. Marin and F. Marino and B. Morana and R. Natali and G. Pandraud and A. Pontin and G.A. Prodi and M. Rossi and P.M. Sarro and D. Vitali and M. Bonaldi",

year = "2016",

doi = "10.1063/1.4953805",

language = "English",

volume = "6",

pages = "065004--1/065004--8",

journal = "AIP Advances",

issn = "2158-3226",

publisher = "American Institute of Physics Publising LLC",

}

Serra, E, Bawaj, M, Borrielli, A, Di Giuseppe, G, Forte, S, Kralj, N, Malossi, N, Marconi, L, Marin, F, Marino, F, Morana, B, Natali, R, Pandraud, G, Pontin, A, Prodi, GA, Rossi, M, Sarro, PM, Vitali, D & Bonaldi, M 2016, 'Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications', AIP Advances, vol. 6, 065004, pp. 065004-1/065004-8. https://doi.org/10.1063/1.4953805

TY - JOUR

T1 - Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

AU - Serra, E.

AU - Bawaj, M.

AU - Borrielli, A.

AU - Di Giuseppe, G.

AU - Forte, S.

AU - Kralj, N.

AU - Malossi, N.

AU - Marconi, L.

AU - Marin, F.

AU - Marino, F.

AU - Morana, B.

AU - Natali, R.

AU - Pandraud, G.

AU - Pontin, A.

AU - Prodi, G.A.

AU - Rossi, M.

AU - Sarro, P.M.

AU - Vitali, D.

AU - Bonaldi, M.

PY - 2016

Y1 - 2016

N2 - In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.

AB - In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.

UR - http://arxiv.org/abs/1601.02669v1

UR - http://resolver.tudelft.nl/uuid:41b8ab3f-1083-454c-bd29-d137586bf6cd

U2 - 10.1063/1.4953805

DO - 10.1063/1.4953805

M3 - Article

SN - 2158-3226

VL - 6

SP - 065004-1/065004-8

JO - AIP Advances

JF - AIP Advances

M1 - 065004

ER -

Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

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