TY - JOUR
T1 - Mimicking an Atomically Thin "Vacuum Spacer" to Measure the Hamaker Constant between Graphene Oxide and Silica
AU - Chu, Liangyong
AU - Korobko, A.V.
AU - Cao, Anping
AU - Sachdeva, Sumit
AU - Liu, Zhen
AU - de Smet, Louis C P M
AU - Sudholter, E.J.R.
AU - Picken, Stephen J.
AU - Besseling, Nicolaas A M
PY - 2017
Y1 - 2017
N2 - The Hamaker constant between graphene oxide and silica, which quantifies the strength of van der Waals forces is determined, by mimicking a “vacuum spacer” in an atomic force microscopyforce study. It is demonstrated that, a 2D spacer is expected to yield an accurately defined separation, owing to the high atom density and strength in planar direction compared with other dimensional spacers.
AB - The Hamaker constant between graphene oxide and silica, which quantifies the strength of van der Waals forces is determined, by mimicking a “vacuum spacer” in an atomic force microscopyforce study. It is demonstrated that, a 2D spacer is expected to yield an accurately defined separation, owing to the high atom density and strength in planar direction compared with other dimensional spacers.
KW - 2D materials
KW - Atomic force microscopy
KW - Graphene oxide
KW - Hamaker constant
KW - Vacuum spacers
UR - http://resolver.tudelft.nl/uuid:ff69215c-eaf4-40dc-8083-0a27f48b45b3
UR - http://www.scopus.com/inward/record.url?scp=85007040107&partnerID=8YFLogxK
U2 - 10.1002/admi.201600495
DO - 10.1002/admi.201600495
M3 - Article
AN - SCOPUS:85007040107
SN - 2196-7350
VL - 4
SP - 1
EP - 5
JO - Advanced Materials Interfaces
JF - Advanced Materials Interfaces
IS - 5
M1 - 1600495
ER -