Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias

M Saadaoui, HW van Zeijl, HTM Pham, HC MKnoops, WMM Kessels, MCM van de Sanden, F Roozeboom, Y Lamy, KB Jinesh, W. Besling, PM Sarro

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationMRS Proceedings Volume 1112, Materials and Technologies for 3-D Integration
EditorsF Roozeboom, C Bower
Place of PublicationWarrendale, PA, US
PublisherMRS
Pages1-8
Number of pages8
ISBN (Print)978-1-60511-084-4
Publication statusPublished - 2009

Publication series

Name
PublisherMRS
Name
Volume1112

Keywords

  • Conf.proc. > 3 pag

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