Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition

M Scotuzzi, MJ Kamerbeek, A Goodyear, M Cooke, CW Hagen

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	1-10
Number of pages	10
Journal	Journal of Micro-Nanolithography MEMS and MOEMS
Volume	14
Issue number	3
DOIs	https://doi.org/10.1117/1.JMM.14.3.031206
Publication status	Published - 2015

art.nr. 031206

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title = "Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition",

author = "M Scotuzzi and MJ Kamerbeek and A Goodyear and M Cooke and CW Hagen",

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year = "2015",

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language = "Undefined/Unknown",

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journal = "Journal of Micro-Nanolithography MEMS and MOEMS",

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TY - JOUR

T1 - Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition

AU - Scotuzzi, M

AU - Kamerbeek, MJ

AU - Goodyear, A

AU - Cooke, M

AU - Hagen, CW

N1 - art.nr. 031206

PY - 2015

Y1 - 2015

U2 - 10.1117/1.JMM.14.3.031206

DO - 10.1117/1.JMM.14.3.031206

M3 - Article

VL - 14

SP - 1

EP - 10

JO - Journal of Micro-Nanolithography MEMS and MOEMS

JF - Journal of Micro-Nanolithography MEMS and MOEMS

IS - 3

ER -