| Original language | Undefined/Unknown |
|---|---|
| Title of host publication | OSA TOPS on extreme ultraviolet lithography |
| Editors | D Kania, GD Kubiak |
| Pages | 152-155 |
| Number of pages | 4 |
| Publication status | Published - 1996 |
Phase correcting layers in EUV imaging systems for microlithography
JJM Braat
Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific