Original language | Undefined/Unknown |
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Pages (from-to) | 353-363 |
Number of pages | 11 |
Journal | Microelectronic Engineering |
Volume | 37/38 |
Publication status | Published - 1997 |
Reactive Ion Etchin of metal stack consisting of an aluminium ally, WGe barrier and Ti adhesion layer
E Sabouret, C Schaffnit, JF Jongste, GCAM Janssen, S Radelaar
Research output: Contribution to journal › Article › Scientific › peer-review