Report on etching of a stack consisting of an aluminum alloy, WGe barrier and Ti adhesion layer. Anisotropy, selectivity to oxide and quality of the adhesion.

E Sabouret; PFM Verhoeven; JF Jongste; GCAM Janssen; S Radelaar

Report on etching of a stack consisting of an aluminum alloy, WGe barrier and Ti adhesion layer. Anisotropy, selectivity to oxide and quality of the adhesion.

E Sabouret, PFM Verhoeven, JF Jongste, GCAM Janssen, S Radelaar

Research output: Book/Report › Report › Professional

Original language	English
Place of Publication	Delft
Publisher	Technische Universiteit Delft
Number of pages	12
Publication status	Published - 1996

Publication series

Name
Publisher	Technsiche Universiteit Delft

Cite this

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title = "Report on etching of a stack consisting of an aluminum alloy, WGe barrier and Ti adhesion layer. Anisotropy, selectivity to oxide and quality of the adhesion.",

author = "E Sabouret and PFM Verhoeven and JF Jongste and GCAM Janssen and S Radelaar",

year = "1996",

language = "English",

publisher = "Technische Universiteit Delft",

}

TY - BOOK

T1 - Report on etching of a stack consisting of an aluminum alloy, WGe barrier and Ti adhesion layer. Anisotropy, selectivity to oxide and quality of the adhesion.

AU - Sabouret, E

AU - Verhoeven, PFM

AU - Jongste, JF

AU - Janssen, GCAM

AU - Radelaar, S

PY - 1996

Y1 - 1996

M3 - Report

BT - Report on etching of a stack consisting of an aluminum alloy, WGe barrier and Ti adhesion layer. Anisotropy, selectivity to oxide and quality of the adhesion.

PB - Technische Universiteit Delft

CY - Delft

ER -