Research on the electrochemical behavior of Si(IV) on the tungsten electrode in CaCl2–CaF2–CaO molten melt

Li Jidong Li*, Hao Ren, Feng Guo, Jinlin Lu, Jing Li, Yongxiang Yang

*Corresponding author for this work

    Research output: Contribution to journalArticleScientificpeer-review

    3 Citations (Scopus)

    Abstract

    Abstract: At 1023 K, the electrochemical behavior of Si(IV) on the tungsten electrode in CaCl2–CaF2–CaO–SiO2 molten salt was studied by cyclic voltammetry, square-wave voltammetry and open-circuit chronopotentiometry. The reduction potential of Si(IV) started at –0.68 V, and the intermediate product CaC2 was observed at –1.78 V. The reduction of Si(IV) on the tungsten electrode was a one-step four-electron transition, which was a diffusion-controlled mass transfer process. The diffusion coefficient for the reduction process of Si(IV) ions was estimated to be 3.22 × 10–5 cm2 s–1 at 1023 K. With the temperature interval from 993 to 1183 K, the diffusion activation energy was calculated to be 4.425 kJ mol–1. Moreover, the deposition of Si(IV) occurs when the applied potential is less than –0.6 V (vs. Pt wire). The present electrochemical study on Si(IV) in the molten salt will be a theoretical reference for future silicon electrorefining.

    Original languageEnglish
    Pages (from-to)486-492
    JournalRussian Journal of Non-Ferrous Metals
    Volume59
    Issue number5
    DOIs
    Publication statusPublished - 2018

    Keywords

    • diffusion coefficient
    • electrochemical behavior
    • nucleation mode
    • silicon

    Fingerprint

    Dive into the research topics of 'Research on the electrochemical behavior of Si(IV) on the tungsten electrode in CaCl2–CaF2–CaO molten melt'. Together they form a unique fingerprint.

    Cite this