Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials

G Fiorentino, B Morana, S Forte, PM Sarro

Research output: Contribution to journal › Article › Scientific › peer-review

3 Citations (Scopus)

Original language	English
Pages (from-to)	1-9
Number of pages	9
Journal	Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
Volume	33
Issue number	art. 01A142
DOIs	https://doi.org/10.1116/1.4904208
Publication status	Published - 2015

Access to Document

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title = "Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials",

author = "G Fiorentino and B Morana and S Forte and PM Sarro",

year = "2015",

doi = "10.1116/1.4904208",

language = "English",

volume = "33",

pages = "1--9",

journal = "Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "art. 01A142",

}

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials

AU - Fiorentino, G

AU - Morana, B

AU - Forte, S

AU - Sarro, PM

PY - 2015

Y1 - 2015

U2 - 10.1116/1.4904208

DO - 10.1116/1.4904208

M3 - Article

SN - 0734-2101

VL - 33

SP - 1

EP - 9

JO - Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films

JF - Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films

IS - art. 01A142

ER -