Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS

AM Nugrowati, SF Pereira, JJM Braat

Research output: Contribution to journalArticleScientificpeer-review

Original languageUndefined/Unknown
Pages (from-to)00-00
Number of pages1
JournalJournal of Applied Physics
Volume00
Issue number00
Publication statusPublished - 2009

Keywords

  • professional journal papers
  • CWTS 0.75 <= JFIS < 2.00

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