Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

C Biasotto; JA Diniz; AM Daltrini; SA Moshkalev; MJR Monteiro

Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

C Biasotto, JA Diniz, AM Daltrini, SA Moshkalev, MJR Monteiro

Microelectronics

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	7777-7782
Number of pages	6
Journal	Thin Solid Films
Volume	516
Issue number	21
Publication status	Published - 2008

Keywords

academic journal papers
Geen BTA classificatie

Cite this

@article{3e241fabb2cb4615a22f7e258e793dcd,

title = "Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications",

keywords = "academic journal papers, Geen BTA classificatie",

author = "C Biasotto and JA Diniz and AM Daltrini and SA Moshkalev and MJR Monteiro",

year = "2008",

language = "Undefined/Unknown",

volume = "516",

pages = "7777--7782",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "21",

}

TY - JOUR

T1 - Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

AU - Biasotto, C

AU - Diniz, JA

AU - Daltrini, AM

AU - Moshkalev, SA

AU - Monteiro, MJR

PY - 2008

Y1 - 2008

KW - academic journal papers

KW - Geen BTA classificatie

M3 - Article

SN - 0040-6090

VL - 516

SP - 7777

EP - 7782

JO - Thin Solid Films

JF - Thin Solid Films

IS - 21

ER -