Single step cryogenic SF6/O2 plasma etching process for the development of inertial devices

G Craciun, H Yang, HW van Zeijl, L Pakula, MA Blauw, EWJM van der Drift, PJ French

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationProceedings of SeSens 2002
Place of PublicationUtrecht
PublisherSTW Stichting voor de Technische Wetenschappen
Pages612-614
Number of pages3
ISBN (Print)90-73461-33-2
Publication statusPublished - 2002
EventSeSens 2002 SAFE2002 ProRISC 2002 Veldhoven, the Netherlands - Utrecht
Duration: 29 Nov 200229 Nov 2002

Publication series

Name
PublisherSTW Stichting voor de Technische Wetenschappen

Conference

ConferenceSeSens 2002 SAFE2002 ProRISC 2002 Veldhoven, the Netherlands
Period29/11/0229/11/02

Keywords

  • Elektrotechniek
  • Techniek
  • Geen BTA classificatie

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