@inproceedings{8e2f4be178c545c58b74b4a2c264587e,
title = "Single step cryogenic SF6/O2 plasma etching process for the development of inertial devices",
keywords = "Elektrotechniek, Techniek, Geen BTA classificatie",
author = "G Craciun and H Yang and {van Zeijl}, HW and L Pakula and MA Blauw and {van der Drift}, EWJM and PJ French",
year = "2002",
language = "Undefined/Unknown",
isbn = "90-73461-33-2",
publisher = "STW Stichting voor de Technische Wetenschappen",
pages = "612--614",
booktitle = "Proceedings of SeSens 2002",
note = "SeSens 2002 SAFE2002 ProRISC 2002 Veldhoven, the Netherlands ; Conference date: 29-11-2002 Through 29-11-2002",
}