Original language | Undefined/Unknown |
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Pages (from-to) | 271-276 |
Number of pages | 6 |
Journal | Microelectronic Engineering |
Volume | 38 |
Publication status | Published - 1997 |
SiOFx and SiO2 deposition in an ECR-HDP reactor: Tool characterisation and film analysis
AJ Kalkman, DJ de Boer, H Fukuda, JBC van de Hilst, GCAM Janssen, S Radelaar
Research output: Contribution to journal › Article › Scientific › peer-review