Size and Shape Control of Sub-20 nm Patterns Fabricated Using Focused Electron Beam Induced Processing

S Hari, CW Hagen, T Verduin, P Kruit

    Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationProc. SPIE 9049, Alternative Lithographic Technologies VI, 90490M
    EditorsD.J. Resnick, C Bencher
    Place of Publications.n.
    PublisherSPIE
    Pages1-4
    Number of pages4
    Publication statusPublished - 2014
    EventSPIE Conference, San José, California, USA. - s.n.
    Duration: 23 Feb 201427 Feb 2014

    Publication series

    Name
    PublisherSPIE
    Name
    Volume9049

    Conference

    ConferenceSPIE Conference, San José, California, USA.
    Period23/02/1427/02/14

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