Size and Shape Control of Sub-20 nm Patterns Fabricated Using Focused Electron Beam Induced Processing

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Pages (from-to)	1-7
Number of pages	7
Journal	Journal of Micro/Nanolithography, MEMS, and MOEMS
Volume	13
Issue number	3
Publication status	Published - 2014

033002

Cite this

@article{cb3030b0b7f04d0dbc14d88f16c8c458,

title = "Size and Shape Control of Sub-20 nm Patterns Fabricated Using Focused Electron Beam Induced Processing",

author = "S Hari and CW Hagen and T Verduin and P Kruit",

note = "033002",

year = "2014",

language = "English",

volume = "13",

pages = "1--7",

journal = "Journal of Micro/Nanolithography, MEMS, and MOEMS",

issn = "1932-5150",

publisher = "SPIE",

number = "3",

}

TY - JOUR

T1 - Size and Shape Control of Sub-20 nm Patterns Fabricated Using Focused Electron Beam Induced Processing

AU - Hari, S

AU - Hagen, CW

AU - Verduin, T

AU - Kruit, P

N1 - 033002

PY - 2014

Y1 - 2014

M3 - Article

SN - 1932-5150

VL - 13

SP - 1

EP - 7

JO - Journal of Micro/Nanolithography, MEMS, and MOEMS

JF - Journal of Micro/Nanolithography, MEMS, and MOEMS

IS - 3

ER -