The application of atomic layer deposition in the production of sorbents for 99Mo/99mTc generator

J. L.T.M. Moret, J. Alkemade, T. M. Upcraft, E. Oehlke, H. T. Wolterbeek, J. R. van Ommen, A. G. Denkova*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

7 Citations (Scopus)
47 Downloads (Pure)

Abstract

New production routes for 99Mo are steadily gaining importance. However, the obtained specific activity is much lower than currently produced by the fission of U-235. To be able to supply hospitals with 99Mo/99mTc generators with the desired activity, the adsorption capacity of the column material should be increased. In this paper we have investigated whether the gas phase coating technique Atomic Layer Deposition (ALD), which can deposit ultra-thin layers on high surface area materials, can be used to attain materials with high adsorption capacity for 99Mo. For this purpose, ALD was applied on a silica-core sorbent material to coat it with a thin layer of alumina. This sorbent material shows to have a maximum adsorption capacity of 120 mg/g and has a99mTc elution efficiency of 55 ± 2% based on 3 executive elutions.

Original languageEnglish
Article number109266
Number of pages9
JournalApplied Radiation and Isotopes
Volume164
DOIs
Publication statusPublished - 2020

Keywords

  • Mo/mTc
  • Sorbent materials

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