The influence of growth kinetics on the relaxation of epitaxially grown RPCVD SI1-x GEx

K Grimm; CCG Visser; LK Nanver; L Vescan; H Lüth

The influence of growth kinetics on the relaxation of epitaxially grown RPCVD SI1-x GEx

K Grimm, CCG Visser, LK Nanver, L Vescan, H Lüth

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Lattice mismatched thin films: proceedings
Editors	EA Fitzgerald
Place of Publication	Warrendale
Publisher	The Minerals, Metals & Materials Society
Pages	25-32
Number of pages	8
ISBN (Print)	0-87339-444-5
Publication status	Published - 1999
Event	1st International Workshop on Lattice-Mismatched and Heterovalent Thin Film Epitaxy, Castelvecchio Pascoli - Warrendale Duration: 13 Sept 1999 → 15 Sept 1999

Publication series

Name
Publisher	the Minerals, Metals & Materials Society

Conference

Conference	1st International Workshop on Lattice-Mismatched and Heterovalent Thin Film Epitaxy, Castelvecchio Pascoli
Period	13/09/99 → 15/09/99

Keywords

ZX Int.klas.verslagjaar < 2002

Cite this

@inproceedings{e7ecb1285ba9422d8b5d75c569309bc5,

title = "The influence of growth kinetics on the relaxation of epitaxially grown RPCVD SI1-x GEx",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "K Grimm and CCG Visser and LK Nanver and L Vescan and H L{\"u}th",

year = "1999",

language = "Undefined/Unknown",

isbn = "0-87339-444-5",

publisher = "The Minerals, Metals & Materials Society",

pages = "25--32",

editor = "{EA Fitzgerald}",

booktitle = "Lattice mismatched thin films: proceedings",

note = "1st International Workshop on Lattice-Mismatched and Heterovalent Thin Film Epitaxy, Castelvecchio Pascoli ; Conference date: 13-09-1999 Through 15-09-1999",

}

Grimm, K, Visser, CCG, Nanver, LK, Vescan, L & Lüth, H 1999, The influence of growth kinetics on the relaxation of epitaxially grown RPCVD SI1-x GEx. in EA Fitzgerald (ed.), Lattice mismatched thin films: proceedings. The Minerals, Metals & Materials Society, Warrendale, pp. 25-32, 1st International Workshop on Lattice-Mismatched and Heterovalent Thin Film Epitaxy, Castelvecchio Pascoli, 13/09/99.

The influence of growth kinetics on the relaxation of epitaxially grown RPCVD SI1-x GEx. / Grimm, K; Visser, CCG; Nanver, LK et al.
Lattice mismatched thin films: proceedings. ed. / EA Fitzgerald. Warrendale: The Minerals, Metals & Materials Society, 1999. p. 25-32.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - The influence of growth kinetics on the relaxation of epitaxially grown RPCVD SI1-x GEx

AU - Grimm, K

AU - Visser, CCG

AU - Nanver, LK

AU - Vescan, L

AU - Lüth, H

PY - 1999

Y1 - 1999

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 0-87339-444-5

SP - 25

EP - 32

BT - Lattice mismatched thin films: proceedings

A2 - EA Fitzgerald, null

PB - The Minerals, Metals & Materials Society

CY - Warrendale

T2 - 1st International Workshop on Lattice-Mismatched and Heterovalent Thin Film Epitaxy, Castelvecchio Pascoli

Y2 - 13 September 1999 through 15 September 1999

ER -