The influence of growth kinetics on the relaxation of epitaxially grown RPCVD Si1-xGex

K Grimm, CCG Visser, LK Nanver, L Vescan, H Lüth

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	SAFE'98: proceedings
Place of Publication	Utrecht
Publisher	STW Technology Foundation
Pages	195-199
Number of pages	5
ISBN (Print)	90-73461-15-1
Publication status	Published - 1998
Event	ProRISC/IEEE CSSP'98, Mierlo - Utrecht Duration: 24 Nov 1998 → 25 Nov 1998

Name
Publisher	STW technology foundation

Conference	ProRISC/IEEE CSSP'98, Mierlo
Period	24/11/98 → 25/11/98

Keywords

@inproceedings{bbf4dd53212f4f0680dcf11ebe96bc52,

title = "The influence of growth kinetics on the relaxation of epitaxially grown RPCVD Si1-xGex",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "K Grimm and CCG Visser and LK Nanver and L Vescan and H L{\"u}th",

year = "1998",

language = "Undefined/Unknown",

isbn = "90-73461-15-1",

publisher = "STW Technology Foundation",

pages = "195--199",

booktitle = "SAFE'98: proceedings",

note = "ProRISC/IEEE CSSP'98, Mierlo ; Conference date: 24-11-1998 Through 25-11-1998",

}

TY - GEN

T1 - The influence of growth kinetics on the relaxation of epitaxially grown RPCVD Si1-xGex

AU - Grimm, K

AU - Visser, CCG

AU - Nanver, LK

AU - Vescan, L

AU - Lüth, H

PY - 1998

Y1 - 1998

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 90-73461-15-1

SP - 195

EP - 199

BT - SAFE'98: proceedings

PB - STW Technology Foundation

CY - Utrecht

T2 - ProRISC/IEEE CSSP'98, Mierlo

Y2 - 24 November 1998 through 25 November 1998

ER -