The need for multi-scale approaches in Cu/low-k reliability issues

CA Yuan, O van der Sluis, WD van Driel, GQ Zhang

Research output: Contribution to journalArticleScientificpeer-review

3 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)833-842
Number of pages10
JournalMicroelectronics Reliability
Volume48
DOIs
Publication statusPublished - 2008

Keywords

  • CWTS JFIS < 0.75

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